The effect of direct PAG incorporation into the polymer main chain on reactive ion etch resistance of 193 nm and EUV chemically amplified resists

✍ Scribed by Cheng-Tsung Lee; Clifford L. Henderson; Mingxing Wang; Kenneth E. Gonsalves; Wang Yueh; Jeanette M. Roberts

• Publisher: Elsevier Science
• Year: 2008
• Tongue: English
• Weight: 213 KB
• Volume: 85
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/j.mee.2008.01.009