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The effect of Cu addition to Al-Si interconnects on stress induced open-circuit failures : S. Mayumi, T. Unemoto, M. Shishino, H. Nanatsue, S. Ueda and M. Inoue. Annual Proceedings of the Reliability Physics Symposium, San Diego, U.S.A., p. 15 (1987)


Publisher
Elsevier Science
Year
1988
Tongue
English
Weight
130 KB
Volume
28
Category
Article
ISSN
0026-2714

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