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The effect of carrier gas and H(hfac) on MOCVD Cu films using (hfac)Cu(1,5-COD) as a precursor

✍ Scribed by W. H. Lee; Y. K. Ko; J. H. Choi; I. J. Byun; H. T. Kwak; D. H. Kim; S. W. Rhee; P. J. Reucroft; J. G. Lee


Book ID
110609372
Publisher
Springer US
Year
2001
Tongue
English
Weight
651 KB
Volume
30
Category
Article
ISSN
0361-5235

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