Effect of tellurium deposition rate on t
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Takahiro Mise; Tokio Nakada
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Article
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2011
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Elsevier Science
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English
β 747 KB
To investigate the effects of tellurium (Te) deposition rate on the properties of Cu-In-Te based thin films (Cu/InΒΌ 0.30-0.31), the films were grown on both bare and Mo-coated soda-lime glass substrates at 200 1C by co-evaporation using a molecular beam epitaxy system. The microstructural properties