The Effect of Applied Voltage and Operating Pressure on Emitted X-Ray from Nitrogen (N2) Gas in APF Plasma Focus Device

✍ Scribed by A. Roomi; E. Saion; M. Habibi; R. Amrollahi; R. Baghdadi; G. R. Etaati; W. Mahmood; M. Iqbal

• Publisher: Springer
• Year: 2011
• Tongue: English
• Weight: 642 KB
• Volume: 30
• Category: Article
• ISSN: 0164-0313
• DOI: 10.1007/s10894-011-9395-2