Influence of substrate and annealing tem
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M.M. Hasan; A.S.M.A. Haseeb; R. Saidur; H.H. Masjuki; M. Hamdi
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Article
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2010
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Elsevier Science
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English
⚖ 653 KB
TiO 2 thin films were deposited on unheated and heated glass substrates at an elevated sputtering pressure of 3 Pa by radio frequency (RF) reactive magnetron sputtering. TiO 2 films deposited at room temperature were annealed in air for 1 h at various temperatures ranging from 300 to 600 °C. The str