𝔖 Bobbio Scriptorium
✦   LIBER   ✦

The Correction of EOG Artifacts by Frequency Dependent and Frequency Independent Methods

✍ Scribed by Theo Gasser; Lothar Sroka; Joachim Möcks

Book ID
118713773
Publisher
John Wiley and Sons
Year
1986
Tongue
English
Weight
669 KB
Volume
23
Category
Article
ISSN
0048-5772

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Frequency-dependent parameter calculatio
Frequency-dependent parameter calculation of the on-chip interconnection lines by the FDTD method
✍ Zheng-Yu Yuan; Zheng-Fan Li 📂 Article 📅 1999 🏛 John Wiley and Sons 🌐 English ⚖ 150 KB 👁 3 views

The frequency-dependent equi¨alent-circuit parameters of the on-chip interconnect structure are first obtained by the time-domain ( ) results from the finite-difference time-domain FDTD procedure. Many technologies are adopted in the time-domain analysis, and the results agree well with a¨ailable da

Suppression of photobleaching-induced ar
Suppression of photobleaching-induced artifacts in frequency-domain FLIM by permutation of the recording order
✍ Erik B. van Munster; Theodorus W.J. Gadella Jr. 📂 Article 📅 2004 🏛 John Wiley and Sons 🌐 English ⚖ 502 KB

## Abstract ## Background Photobleaching can lead to significant errors in frequency‐domain fluorescence lifetime imaging microscopy (FLIM). Existing correction methods for photobleaching require additional recordings and processing time and can result in additional noise. A method is introduced t