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The combined effects of deuterium anneals and deuterated barrier-nitride processing on hot-electron degradation in MOSFET's

✍ Scribed by Ference, T.G.; Burnham, J.S.; Clark, W.F.; Hook, T.B.; Mittl, S.W.; Watson, K.M.; Liang-Kai Kevin Han


Book ID
114537679
Publisher
IEEE
Year
1999
Tongue
English
Weight
207 KB
Volume
46
Category
Article
ISSN
0018-9383

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