The characteristics of reactive ion etching of polysilicon using SF6/O2 and their interdependence : U. S. Tandon and B. D. Pant. Vacuum42(13), 837 (1991)

• Publisher: Elsevier Science
• Year: 1992
• Tongue: English
• Weight: 233 KB
• Volume: 32
• Category: Article
• ISSN: 0026-2714
• DOI: 10.1016/0026-2714(92)90604-j