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The behaviour of radiation-induced gate-oxide defects in MOSFETs during annealing at 140°C

✍ Scribed by M. Pejović; A. Jakšić; G. Ristić


Book ID
117149404
Publisher
Elsevier Science
Year
1998
Tongue
English
Weight
229 KB
Volume
240
Category
Article
ISSN
0022-3093

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