The application of reactive ion etching to the definition of patterns in A1-Si-Cu conductor layers and thick silicon oxide films: Andrews A. Chambers Solid St. Technol., 83 (January 1983)

• Publisher: Elsevier Science
• Year: 1985
• Tongue: English
• Weight: 96 KB
• Volume: 16
• Category: Article
• ISSN: 0026-2692
• DOI: 10.1016/s0026-2692(85)80229-9