✦ LIBER ✦
The application of low angle Rutherford backscattering and channelling techniques to determine implantation induced disorder profile distributions in semiconductors
✍ Scribed by N.A.G. Ahmed; C.E. Christodoulides; G. Carter; M.J. Nobes; A.I. Titov
- Publisher
- Elsevier Science
- Year
- 1980
- Weight
- 469 KB
- Volume
- 168
- Category
- Article
- ISSN
- 0029-554X
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