The application of a computer in the design and manufacture of photolithographic masks for LSI interconnection patterns : P. E. Radley, T. J. Rowe and D. J. Moule, Proc. Tech. Programme Int. Electron. Packaging Prod. Conf., Brighton, October 8–10 (1968), p. 556

• Publisher: Elsevier Science
• Year: 1969
• Tongue: English
• Weight: 99 KB
• Volume: 8
• Category: Article
• ISSN: 0026-2714
• DOI: 10.1016/0026-2714(69)90068-7