The analysis of process gases: a review
β Scribed by K. D. Cleaver
- Publisher
- Springer-Verlag
- Year
- 2001
- Tongue
- English
- Weight
- 220 KB
- Volume
- 6
- Category
- Article
- ISSN
- 0949-1775
No coin nor oath required. For personal study only.
π SIMILAR VOLUMES
The relation between the deposition rate of the films and the velocity distribution in the flow field is investigated in detail. The thin SiN films are deposited on Si substrates by the infrared thermal chemical vapor deposition (CVD) at 600 Β°C, flux ratio (NH3/Si2H6) of 50 and 800 and total pressur
## Abstract Membrane emulsification has received increasing attention over the last 10 years, with potential applications in many fields. In the membrane emulsification process, a liquid phase is pressed through the membrane pores to form droplets at the permeate side of a membrane; the droplets ar