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The analyses of an SiF4 plasma in an R.F. glow discharge for preparing fluorinated amorphous silicon thin films

✍ Scribed by N. Mutsukura; M. Ohuchi; S. Satoh; Y. Machi


Publisher
Elsevier Science
Year
1983
Tongue
English
Weight
581 KB
Volume
109
Category
Article
ISSN
0040-6090

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