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Tetrahedral amorphous carbon films prepared by magnetron sputtering and dc ion plating

✍ Scribed by Schwan, J.; Ulrich, S.; Roth, H.; Ehrhardt, H.; Silva, S. R. P.; Robertson, J.; Samlenski, R.; Brenn, R.

Book ID
111653450
Publisher
American Institute of Physics
Year
1996
Tongue
English
Weight
442 KB
Volume
79
Category
Article
ISSN
0021-8979

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Amorphous and microcrystalline GeC:H fil
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## Abstract Hydrogenated germanium‐carbon alloy (GeC:H) films have been deposited by a reactive rf magnetron sputtering of Ge in methane–argon gas mixtures. As the second sputtering gas, helium is utilized in order to control the film properties. The effect of helium partial pressure ratio __R__ to