𝔖 Bobbio Scriptorium
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Test strategy enhances, speeds the development of a microprocessor: Karl Guttag, Robert Puckett, Stephen Sacarisen and Thomas Dye Electronics 84 (29 Dec 1981)


Book ID
104157140
Publisher
Elsevier Science
Year
1984
Tongue
English
Weight
90 KB
Volume
15
Category
Article
ISSN
0026-2692

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✦ Synopsis


threshold voltage to the changes of phosphorus bulk concentration in the substrate. Higher dose or energy of implanted ions is necessary in this case to produce the burried channel. The threshold voltage shift towards negative voltage values caused by substrate impurity segregation is demonstrated.

Etching SiO2 in a reactive ion beam