✦ LIBER ✦
Temporal velocity distribution of positive and negative ions incident on a wafer in a pulsed two-frequency capacitively coupled plasma in CF/sub 4//Ar for SiO/sub 2/ etching
✍ Scribed by Yagisawa, T.; Makabe, T.
- Book ID
- 127224742
- Publisher
- IEEE
- Year
- 2003
- Tongue
- English
- Weight
- 604 KB
- Volume
- 31
- Category
- Article
- ISSN
- 0093-3813
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