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Temperature-driven local rearrangement in the Er environment of Er-doped silica glass films prepared by rf-cosputtering deposition

✍ Scribed by F. Gonella; G. Battaglin; E. Cattaruzza; E. Trave; A. Leto; G. Pezzotti


Book ID
113937440
Publisher
Elsevier Science
Year
2012
Tongue
English
Weight
710 KB
Volume
520
Category
Article
ISSN
0040-6090

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