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Temperature dependent time-to-breakdown (TBD) of TiN/HfO2 n-channel MOS devices in inversion

✍ Scribed by N.A. Chowdhury; X. Wang; G. Bersuker; C. Young; N. Rahim; D. Misra


Book ID
108210800
Publisher
Elsevier Science
Year
2009
Tongue
English
Weight
271 KB
Volume
49
Category
Article
ISSN
0026-2714

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