Technology and applications of broad-beam ion sources used in sputtering. Part I. Ion source technology: H R Kaufman et al,J Vac Sci Technol, 21 (3), 1982, 725–736

• Publisher: Elsevier Science
• Year: 1985
• Tongue: English
• Weight: 170 KB
• Volume: 35
• Category: Article
• ISSN: 0042-207X
• DOI: 10.1016/0042-207x(85)90274-x