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Technique for transfer of high-density, high-aspect-ratio nanoscale patterns in UV nanoimprint lithography and measurement of the release force

✍ Scribed by Jun Taniguchi; Yasuhiro Kamiya; Takeshi Ohsaki; Nobuji Sakai


Publisher
Elsevier Science
Year
2010
Tongue
English
Weight
801 KB
Volume
87
Category
Article
ISSN
0167-9317

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