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Tailoring silicon oxide film properties by tuning the laser beam-to-substrate distance in ArF laser-induced chemical vapor deposition

✍ Scribed by T. Szörényi; P. González; E. Garcá; J. Pou; D. Fernández; J. Serra; B. León; M. Pérez-Amor


Publisher
Elsevier Science
Year
1994
Tongue
English
Weight
312 KB
Volume
241
Category
Article
ISSN
0040-6090

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