𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Systematic study of the interdependence of exposure and development conditions and kinetic modelling for optimizing low-energy electron beam nanolithography

✍ Scribed by M.A. Mohammad; T. Fito; J. Chen; S. Buswell; M. Aktary; M. Stepanova; S.K. Dew


Publisher
Elsevier Science
Year
2010
Tongue
English
Weight
569 KB
Volume
87
Category
Article
ISSN
0167-9317

No coin nor oath required. For personal study only.