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Synthesis of Polysulfides Containing the Triazeno Group and Their Application as Photoresists in Excimer Laser Polymer Ablation

✍ Scribed by Nuyken, O.; Dahn, U.; Ehrfeld, W.; Hessel, V.; Hesch, K.; Landsiedel, J.; Diebel, J.

Book ID
126405296
Publisher
American Chemical Society
Year
1997
Tongue
English
Weight
439 KB
Volume
9
Category
Article
ISSN
0897-4756

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