Synthesis and photopolymerization of phosphonic acid monomers for applications in compomer materials

✍ Scribed by Yohann Catel; Loïc Le Pluart; Pierre-Jean Madec; Thi-Nhàn Pham

• Publisher: John Wiley and Sons
• Year: 2010
• Tongue: English
• Weight: 843 KB
• Volume: 117
• Category: Article
• ISSN: 0021-8995
• DOI: 10.1002/app.30952

✦ Synopsis

Abstract

Novel methacrylate monomers bearing phosphonic acid groups 1 and 2 as well as new sulfur methacrylates 9 and 10 have been prepared in good yields from thiophenol. They have been fully characterized by ^1^H‐NMR, ^13^C‐NMR, ^31^P‐NMR, and HRMS. Their copolymerization with a bis‐GMA : TEGDMA (1 : 1) blend has been investigated with photodifferential scanning calorimetry at 50°C with camphorquinone as a photoinitiator and ethyl 4‐(dimethylamino)benzoate (EDAB) as a coinitiator. The higher the content of acidic monomer 1 or 2 incorporated in the bis‐GMA : TEGDMA (1 : 1) blend, the lower the mixtures reactivity. The phosphonic acid group has been proved to be responsible for this drop of reactivity. © 2010 Wiley Periodicals, Inc. J Appl Polym Sci, 2010