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Synthesis and characterization of poly[(methyl methacrylate)-co-(methacrylic acid)] for a UV-sensitive aqueous base developable lithographic plate

✍ Scribed by Suda Kiatkamjornwong; Suteera Tessiri

Publisher: John Wiley and Sons
Year: 2002
Tongue: English
Weight: 107 KB
Volume: 86
Category: Article
ISSN: 0021-8995
DOI: 10.1002/app.11092

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