✦ LIBER ✦
Synchrotron radiation lithography applied to fabrication of deep-submicrometer NMOS devices at all exposure levels
✍ Scribed by A. Yoshikawa; T. Horiuchi; K. Deguchi; M. Miyake; E. Yamamoto; Y. Sakakibara; T. Kitayama
- Publisher
- Elsevier Science
- Year
- 1990
- Tongue
- English
- Weight
- 360 KB
- Volume
- 11
- Category
- Article
- ISSN
- 0167-9317
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