Reactivity of Silicon Surfaces in the Pr
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Carlo Cavallotti
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Article
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2010
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John Wiley and Sons
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English
β 263 KB
## Abstract The desorption of hydrogen and hydrogen chloride from Si surfaces is the rateβdetermining step of the low temperature CVD of silicon from both hydrogenated and chlorinated precursors. Thus, in order to model the deposition process, the rate of these reactions must be known to a high lev