Surface-sensitive Raman scattering study on a-Si:H network formation process during deposition and H2 plasma annealing

✍ Scribed by Seiichi Miyazaki; Nobuki Fukuhara; Masataka Hirose

• Book ID: 117150262
• Publisher: Elsevier Science
• Year: 2000
• Tongue: English
• Weight: 229 KB
• Volume: 266-269
• Category: Article
• ISSN: 0022-3093
• DOI: 10.1016/s0022-3093(99)00729-2