𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Surface relaxation during plasma chemical vapor deposition of diamond-like carbon films, investigated by in-situ ellipsometry

✍ Scribed by A von Keudell; T Schwarz-Selinger; W Jacob


Book ID
114086197
Publisher
Elsevier Science
Year
1997
Tongue
English
Weight
146 KB
Volume
308-309
Category
Article
ISSN
0040-6090

No coin nor oath required. For personal study only.


πŸ“œ SIMILAR VOLUMES


Influence of substrate surface topograph
✍ Ana Paula Mousinho; Ronaldo Domingues Mansano; Maria CecΓ­lia Salvadori πŸ“‚ Article πŸ“… 2009 πŸ› Elsevier Science 🌐 English βš– 708 KB

In this work, we have studied the influence of the substrate surface condition on the roughness and the structure of the nanostructured DLC films deposited by High Density Plasma Chemical Vapor Deposition. Four methods were used to modify the silicon wafers surface before starting the deposition pro