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Surface morphology improvement of GaAs-on-Si using a two-reactor MOCVD system and an AlAs/GaAs low temperature buffer layer: an approach to crack-free GaAs-on-Si

✍ Scribed by T. Nishimura; K. Kadoiwa; N. Hayafuji; M. Miyashita; K. Mitsui; H. Kumabe; T. Murotani


Book ID
107790750
Publisher
Elsevier Science
Year
1991
Tongue
English
Weight
285 KB
Volume
107
Category
Article
ISSN
0022-0248

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