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Surface modification of doped ZnO thin films

✍ Scribed by S. Flickyngerova; J. Skriniarova; M. Netrvalova; J. Kovac Jr.; I. Novotny; P. Sutta; V. Tvarozek


Publisher
Elsevier Science
Year
2010
Tongue
English
Weight
696 KB
Volume
256
Category
Article
ISSN
0169-4332

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✦ Synopsis


Effects of photo-assisted electrodeless and ion RF-sputter etching on the structural and optical properties of sputtered ZnO:Al thin films were investigated. Photo-assisted electrodeless etching was appropriate for getting "smooth" surfaces and ion RF-sputter etching by high power has significantly modified the surface roughness with an increase of the light diffuse transmittance.


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