With the propose of investigating the effect of transition elements in ZnO thin films prepared by the Successive Ion Layer Adsorption and Reaction (SILAR) technique, the deposition solutions were chemically impurified with Ni, Cu, and Cd, as elements of the Ib, IIb, and VIIIa groups. X-ray fluoresce
Surface modification of doped ZnO thin films
β Scribed by S. Flickyngerova; J. Skriniarova; M. Netrvalova; J. Kovac Jr.; I. Novotny; P. Sutta; V. Tvarozek
- Publisher
- Elsevier Science
- Year
- 2010
- Tongue
- English
- Weight
- 696 KB
- Volume
- 256
- Category
- Article
- ISSN
- 0169-4332
No coin nor oath required. For personal study only.
β¦ Synopsis
Effects of photo-assisted electrodeless and ion RF-sputter etching on the structural and optical properties of sputtered ZnO:Al thin films were investigated. Photo-assisted electrodeless etching was appropriate for getting "smooth" surfaces and ion RF-sputter etching by high power has significantly modified the surface roughness with an increase of the light diffuse transmittance.
π SIMILAR VOLUMES
In this paper, surface morphology and optical properties are investigated to find the optimum microstructure of zinc oxide (ZnO) thin films deposited by radio frequency (RF) magnetron sputtering. To achieve a high transmittance and a low resistivity, we examined various film deposition conditions. T