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Surface characteristics of etched parylene-C films for low-damaged patterning process using inductively-coupled O2/CHF3 gas plasma

✍ Scribed by Ham, Yong-Hyun; Shutov, Dmitriy Alexandrovich; Kwon, Kwang-Ho


Book ID
123295672
Publisher
Elsevier Science
Year
2013
Tongue
English
Weight
671 KB
Volume
273
Category
Article
ISSN
0169-4332

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