Surface analytical studies of Ar-plasma etching of thin heptadecafluoro-1-decene plasma polymer films

Inductively coupled plasma etching of a

Inductively coupled plasma etching of a Pb(ZrxTi1−x)O3 thin film in a HBr/Ar plasma

✍ Chee Won Chung; Yo Han Byun; Hye In Kim 📂 Article 📅 2002 🏛 Elsevier Science 🌐 English ⚖ 780 KB

The etching of Pb(Zr Ti )O (PZT) thin films was performed using HBr /Ar gas in an inductively coupled plasma. The etch rate and etch profile of the PZT films were investigated as a function of the gas concentration of the HBr /Ar mixture. In addition, the etch parameters, including coil power, dc b