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Surface amorphization, sputter rate, and intrinsic stresses of silicon during low energy Ga+ focused-ion beam milling

✍ Scribed by Lars Pastewka; Roland Salzer; Andreas Graff; Frank Altmann; Michael Moseler


Book ID
108224594
Publisher
Elsevier Science
Year
2009
Tongue
English
Weight
1010 KB
Volume
267
Category
Article
ISSN
0168-583X

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