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Suppression of parasitic bipolar action in ultra-thin-film fully-depleted CMOS/SIMOX devices by Ar-ion implantation into source/drain regions

✍ Scribed by Ohno, T.; Takahashi, M.; Kado, Y.; Tsuchiya, T.


Book ID
114537265
Publisher
IEEE
Year
1998
Tongue
English
Weight
167 KB
Volume
45
Category
Article
ISSN
0018-9383

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