Suppression of interfacial boron accumulation and defect density in molecular beam epitaxial silicon : Dawei Gong et al. Solid State Communications, 88(9), 731 (1993)

• Publisher: Elsevier Science
• Year: 1994
• Tongue: English
• Weight: 104 KB
• Volume: 34
• Category: Article
• ISSN: 0026-2714
• DOI: 10.1016/0026-2714(94)90436-7