Superconducting flux flow transistor fabricated by an inductively coupled plasma etching technique

✍ Scribed by Hyeong-Gon Kang; Y.-H. Im; Seokcheol Ko; Sung-Hun Lim; B.-S. Han; Y.B. Hahn

• Publisher: Elsevier Science
• Year: 2004
• Tongue: English
• Weight: 344 KB
• Volume: 400
• Category: Article
• ISSN: 0921-4534
• DOI: 10.1016/j.physc.2003.07.004