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Superconducting amorphous Al−Cu films of high stability

✍ Scribed by A. Lambrecht; H. Leitz; J. Hasse

Book ID: 112516381
Publisher: Springer
Year: 1980
Tongue: English
Weight: 539 KB
Volume: 38
Category: Article
ISSN: 1434-6036
DOI: 10.1007/bf01321200

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were obtained by keeping the power for the Nb deposition constant at 0.85 W/cm 2 (deposition rate of 1.7 nm/min) and changing the power for the Si deposition from 2 W/cm 2 (2.7 nm/min) to 5.1 W/cm 2 (6.7 nm/min). Per cycle about one monolayer NbSi is deposited. Series A contains 70% Nb and 30 % Si,