✦ LIBER ✦
Substrate orientation dependence of self-limited atomic-layer etching of Si with chlorine adsorption and low-energy Ar+ irradiation
✍ Scribed by Koji Suzue; Takashi Matsuura; Junichi Murota; Yasuji Sawada; Tadahiro Ohmi
- Publisher
- Elsevier Science
- Year
- 1994
- Tongue
- English
- Weight
- 443 KB
- Volume
- 82-83
- Category
- Article
- ISSN
- 0169-4332
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