✦ LIBER ✦
Submicro- and nanometer e-beam lithography and reactive ion etching with single layer chemically amplified negative resist
✍ Scribed by I.W. Rangelow; P. Hudek; I. Kostič; Z. Borkowicz; G. Stangl
- Publisher
- Elsevier Science
- Year
- 1994
- Tongue
- English
- Weight
- 424 KB
- Volume
- 23
- Category
- Article
- ISSN
- 0167-9317
No coin nor oath required. For personal study only.