✦ LIBER ✦
Sub-quarter micron phase shifting lithography using the desire process at 248 nm (deep UV)
✍ Scribed by K. Ronse; R. Jonckheere; A.M. Goethals; K.H. Baik; L. Van den hove
- Publisher
- Elsevier Science
- Year
- 1992
- Tongue
- English
- Weight
- 439 KB
- Volume
- 17
- Category
- Article
- ISSN
- 0167-9317
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