✦ LIBER ✦
Sub-50 nm patterning by immersion interference lithography using a Littrow prism as a Lloyd’s interferometer
✍ Scribed by de Boor, Johannes; Kim, Dong Sik; Schmidt, Volker
- Book ID
- 115433825
- Publisher
- Optical Society of America
- Year
- 2010
- Tongue
- English
- Weight
- 437 KB
- Volume
- 35
- Category
- Article
- ISSN
- 0146-9592
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