Sub-100-nm Pattern Formation through Selective Chemical Transformation of Self-Assembled Monolayers by Soft X-ray Irradiation

✍ Scribed by La, Young-Hye; Jung, Yu Jin; Kim, Hyun Ju; Kang, Tai-Hee; Ihm, Kyuwook; Kim, Ki-Jung; Kim, Bongsoo; Park, Joon Won

• Book ID: 127194866
• Publisher: American Chemical Society
• Year: 2004
• Tongue: English
• Weight: 8 KB
• Volume: 20
• Category: Article
• ISSN: 0743-7463
• DOI: 10.1021/la0487085