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Study on the spatial resolution of a furfuryl alcohol-negative photoresist using a holographic system

✍ Scribed by M. Sthel; J. Rieumont; R. Martinez


Publisher
John Wiley and Sons
Year
1999
Tongue
English
Weight
147 KB
Volume
71
Category
Article
ISSN
0021-8995

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✦ Synopsis


A negative photoresist was obtained from furfury alcohol using methylene dichloride as a solvent and trifluoracetic acid as a catalyst. A holographic assembly with a blue laser failed to give interference patterns. However, a periodic interference pattern was printed on a film of furfuryl alcohol resin using an ultraviolet laser with a coherent beam at 360 nm. The period of the pattern was reproduced throughout the film and resulted about 0.46 m. Thus, the resin obtained was able to reach a resolution about 0.23 m.