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Study on electrical characteristics of fluorinated polyimide film

โœ Scribed by Y. K. Lee; S. P. Murarka


Book ID
111534681
Publisher
Springer
Year
1998
Tongue
English
Weight
194 KB
Volume
33
Category
Article
ISSN
0022-2461

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The dielectric properties and reliability of fluorinated HfO 2 have been studied. The fluorinated HfO 2 dielectric treated by NF 3 plasma showed improved dielectric characteristics but resulted in interfacial layer (IL) regrowth during the fluorine plasma treatment process, which led to an oxide cap