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Study of the growth kinetics of oxidation-induced stacking faults in separation by implanted oxygen structures using a new chemical etching process

✍ Scribed by D. Tsoukalas; C. Tsamis; N. Guillemot; J. Stoemenos; J. Margail


Publisher
Elsevier Science
Year
1992
Tongue
English
Weight
340 KB
Volume
12
Category
Article
ISSN
0921-5107

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