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Study of the 300-mm CoSi2 defects induced by Soft Sputter Etch process before cobalt deposition—characterization, design of experiment and 200/300 mm comparison

✍ Scribed by A. Humbert; C. Regnier; G. Braeckelmann; M.-T. Basso; P. Ferreira


Book ID
104062046
Publisher
Elsevier Science
Year
2004
Tongue
English
Weight
402 KB
Volume
114-115
Category
Article
ISSN
0921-5107

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