✦ LIBER ✦
Study of Ta(N,O) diffusion barrier stability: analytical and electrical characterization of low level Cu contamination in Si
✍ Scribed by M. Stavrev; D. Fischer; C. Wenzel; T. Heiser
- Book ID
- 114155678
- Publisher
- Elsevier Science
- Year
- 1997
- Tongue
- English
- Weight
- 454 KB
- Volume
- 37-38
- Category
- Article
- ISSN
- 0167-9317
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